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等离子蚀刻 Plasma Etching.pdf
April12, 2012 Dr. Lynn Fuller/Dr. Richard Lane Rochester Institute TechnologyMicroelectronicEngineer
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电浆化学气相沉积、溅镀与蚀刻 Plasma CVD, Sputtering and Etching - Principles and Technology.pdf
Plasma CVD, Sput ering Etchi ng Princi pl es Technology 成功大學化工系Prof.Franklin Chau-nan HongDept. Chem
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Plasma Etching - RIT - People - Home等离子体蚀刻该人的家.pdf
Plasma Etching - RIT - People - Home等离子体蚀刻该人的家论文 总结 英语 资料 ppt 文档 免费阅读 免费分享,如需请下载!
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integrated plasma equipment model for polysilicon etch:多晶硅蚀刻的集成等离子体设备模型.pdf
integrated plasma equipment model for polysilicon etch:多晶硅蚀刻的集成等离子体设备模型
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acid etching and plasma sterilization fail to improve:酸蚀刻和改善等离子体sterilization故障.pdf
acid etching and plasma sterilization fail to improve:酸蚀刻和改善等离子体sterilization故障
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diagnostics for plasma processing etching plasmas invited:等离子体处理蚀刻等离子体的诊断.pdf
diagnostics for plasma processing etching plasmas invited:等离子体处理蚀刻等离子体的诊断
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smooth etching of epitaxially grown aln film by cl2bcl3ar-based inductively coupled plasma:平滑的蚀刻的外延生长aln薄膜的cl2bcl3ar基于电感耦合等离子体.pdf
smooth etching of epitaxially grown aln film by cl2bcl3ar-based inductively coupled plasma:平滑的蚀刻的外延生长aln薄膜的cl2bcl3ar基于电感耦合等离子体
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etch damage evaluation on (bi4xlax)ti3o12 thin films during the etch process using inductively coupled plasma sources:腐蚀损伤评价(bi4xlax)ti3o12薄膜的蚀刻过程中使用电感耦合等离子体源中.pdf
etch damage evaluation on (bi4xlax)ti3o12 thin films during the etch process using inductively coupled plasma sources:腐蚀损伤评价(bi4xlax)ti3o12薄膜的蚀刻过程中使用电感耦合等离子体源中
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topography preserved microwave plasma etching for top-down layer engineering in mos2 and other van der waals materials.[.地形保护微波等离子体蚀刻自上而下层工程建设监理和其它范德瓦耳.pdf
topography preserved microwave plasma etching for top-down layer engineering in mos2 and other van der waals materials.[.地形保护微波等离子体蚀刻自上而下层工程建设监理和其它范德瓦耳
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Plasma Etching Ashing Technical Brief等离子体蚀刻灰化技术简介.pdf
Plasma Etching Ashing Technical Brief等离子体蚀刻灰化技术简介论文 总结 英语 资料 ppt 文档 免费阅读 免费分享,如需请下载!

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