Structural characterization of amorphous hydrogenated-carbon nitride (aH-CNx) film deposited by CH4N2 dielectric barrier discharge plasma 13C, 1H solid state NMR, FTIR and elemental analysis
本文档由 3371160 分享于2015-11-08 11:46
Structural characterization of amorphous hydrogenated-carbon nitride (aH-CNx) film deposited by CH4N2 dielectric barrier discharge plasma 13C, 1H solid state NMR, FTIR and elemental analysis
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君，已阅读到文档的结尾了呢~~